光刻仿真中二維掩模近場(chǎng)的擴(kuò)展傅立葉分析和嚴(yán)格耦合波分析.pdf

1、蘭州大學(xué)碩士學(xué)位論文光刻仿真中二維掩模近場(chǎng)的擴(kuò)展傅立葉分析和嚴(yán)格耦合波分析姓名：劉佳申請(qǐng)學(xué)位級(jí)別：碩士專業(yè)：物理學(xué)、無(wú)線電物理指導(dǎo)教師：張曉萍20080601AnalysisofNearfieldforPhotomaskBasedonExtendedFourierDiffractionTheoryandRigorousCoupled—WaveMethod論文摘要(英文)AbstractInordertoimprovetheresolut

2、ionofphotolithographicsystem，manyresolutionenhancetechnologywereusedwhichwerephaseshiftingmaskoffaxisillumination，opticalproximitycorrection，andSOonSothehypernumericalaperturesmallcurrentdimensionandthickmaskwereneededAn

3、dthen，normalscalardiffractiontheorywasnotexactanymoreExtendedscalardiffractiontheoryandrigorouselectromagneticmethodwereusedtosimulatethenearfieldsfordifferentmaskmodelTwomethodswereusedinthispapertogetthediffractioneffi

4、cienciesandthenearfields，onemethodwascalledextendedfourierdiffractiontheoryanotherwascalledrigorouscoupledwaveanalysisHowever，analysisoftransferfunctionwithFourierdiffractiontheorywillbeinadequate，andshadowingeffectsmust

5、beconsideredforobliqueilluminationTherefore，anewapproximationmodelforalternatingphaseshiftmaskconsideringshadowingeffectswasproposedinthispaper，ExtendedFourierdiffractiontheorywasused，andarelationoffunctiondependedoninci

6、dentangleDiffractionefficienciesandinterferencefieldsweresimulatedusingapproximationmodelRigorouscoupledwaveanalysisisamethodwhichsolvingMaxwellequationtogetthenearfieldofthemaskForthismethoddoesn’tuseanyapproximationins

7、olvingMaxwellequation，itisarigorousmethodWegotthediffractionefficienciesandthenearfieldsInthispaperourmaskWasconsideredinfinitelyintheYdirection，SOMaxwellequationwassimplifiedtoheatwo—dimensionalproblem，andwecansavetimeT

8、EpolarizationandTMpolarizationincidentlightdiffractionefficiencieschangewithincidentangleandmaskpitchwerebothcalculatedAndtheresultsoftwomethodswerecomparedatlastTherigorouselectromagneticmethodwasmoreexactthantheextende